Ion Beam Technology
4Wave is the industry leader in thin film nanotechnology material science and products. Our core technology is Ion Beam technology and Biased target technology. 4Wave offers the most advanced and cost efficient technologies for Ion Beam Etching (IBE), Ion Beam deposition sputtering (IBS) and Biased Target Sputtering BTS. 4Wave is the industry leader in the development of thin film processes and applications.
4Wave is a global company with products in North America (US and Canada), Europe and Asia. 4Wave offers products and solutions to various markets including Semiconductor, MEMS (Micro-Electromechanical Systems), Data Storage and thin film optics.
Ion Beam Sputtering Cluster Tool
Laboratory Alloy and Nanolayer System (LANS)
Load Lock Etch System
Planetary Etch System (PSIBE)
Design & Prototyping
Optical Thin Film Coatings
Thin Film Processing
Biased Target Sputtering (BTS)
Direct Ion Beam Deposition
In-Situ Process Monitoring
Ion Assisted Evaporation
Ion Beam Etch
Ion Beam Sputtering
Angstrom Scientific Inc. is a distributor and manufacturer’s representative, focused on providing characterization solutions to the nanotech marketplace in the Americas. Companies represented:
Provides surface analysis solutions in a number of key application areas.
Deben manufactures innovative accessories for SEM’s and TEM’s, along with a large range of in-situ tensile testing stages for use with Optical Microscopes, X-Ray CT and XRD systems.
DENSsolution is a leading supplier of top quality sample management solutions to enable atomic resolution, dynamic in-situ electron microscopy.
Encapsulix addresses the geometric scaling of critical Atomic Layer Deposition (ALD) requirements for industrial & microelectronic devices and films. Initial process focus is in thin Al2O3, TiO2 and ZnO specifically for encapsulation and barrier coatings.
Hitachi Nanotechnology Systems Division:
Hitachi Nanotechnology Systems Division (NSD) supportscustomers with a wide range of instrumentation, including scanning electron microscopy (SEM), analytical and biological transmission electron microscopy (TEM), dedicated STEM, Focused Ion Beam (FIB), tabletop microscopes, and microanalysis sample preparation systems.
Jordan Valley Semiconductors Ltd. provides metrology solutions for thin films based on novel, rapid, non-contacting and non-destructive X-ray technology.
Kleindiek Nanotechnik offers a new level of precision in manipulation, probing, and characterization of nano-materials and semiconductors
Mel-Build provides a wide verity of specialized holders for Transmission Electron Microscopes.
Microtrac strives to provide the materials characterization world with innovative, reliable, and repeatable particle size, particle shape, particle charge, and surface area analysis instrumentation.
XEI Scientific, Inc.provides an effective way to gently clean scanning electron microscopes (SEMs), focused ion beams (FIBs) and other vacuum systems.
Asahi Spectra Co. (ASC) was founded in 1970 in Tokyo, Japan by 3 engineers. ASC has been developing a vacuum deposition technology such as ion assisted deposition (IAD) and ion beam sputtering (IBS) , which achieve hard coating, excellent durability for environment (humidity, low or high temperature, thermal shock or vacuum) and stability of spectral performance. By now our optical filters have contributed in various markets such as astronomy, semiconductor, biotechnology, education and so on.
Nowadays, customer requirements are becoming more complicated as optical innovation advances, and most requirements cannot be satisfied by just optical filter technology. So we have been trying to expand our field to optical instruments based on our 40 years accumulated optical know-how as you can see how professional our optical instruments are.
Our integrated manufacturing process by both filter and instrument specialists is the most competitive advantage against “other only-optical-filter makers”.
Asahi Spectra USA Inc. was established in January, 2005 in California in order to distribute the Asahi Spectra brand in USA and all over the world. Major Customers in the US include:
California Institute of Technology
Denton Vacuum transforms barriers into thin-film technology breakthroughs for customers across the globe in providing vacuum deposition systems. With operations in the United States and China, Denton engineers, designs and develops systems that precision-coat aerospace components, advanced optics, medical implants, solar cells, semiconductor devices and much more. Denton’s technology portfolio includes thermal evaporation, ion beam etching, ion-beam-assisted evaporation, plasma-enhanced-chemical-vapor deposition (PECVD), and ion-beam-assisted deposition (IBAD) and e-beam evaporation and magnetron sputtering system (including reactive sputtering). Denton also provides value-added services and lifetime support that set new industry standards. Fifty years of tireless innovation have produced robust offerings ranging from high-volume production platforms to unique custom-engineered systems.
Ion Beam Assisted Deposition
Ion Beam Deposition
Ion Beam Etchning
Reactive Beam Etch
High Performance Liquid Chromatographs (HPLC) & Amino Acid Analyzers (AAA)
Spectrophotometers (UV-Vis IR, FL)
XRF Coating Thickness Measurements
Electron Microscopes (SEM, TEM, STEM)
Focus Ion Beam Systems (FIB, FIB-SEM)
Atomic Force Microscopes (AFM)
Vince Carlino founded ibss Group, Inc. in 2002 in order to continue developing field-free ion beam (IBS) deposition systems for EM specimen preparation. The IBS system and the Dimpler, developed by VCR Group, set the standard for specimen deposition and preparation.
In 2003, ibss Group agreed to market a tool to minimize hydrocarbon contamination in SEMs by remote or downstream (DS) oxidation. Mr. Carlino assumed Global Sales responsibility to introduce an innovative plasma process for the removal of gas phase hydrocarbon contamination in electron beam instruments.
In 2007, ibss Group began cooperating with an inventor of a unique, patented plasma source. ibss Group developed and produced the GV10x, a new paradigm in situ downstream plasma asher. Competitively priced, the GV10x Downstream Asher reduces carbon & hydrocarbon contamination 10 to 20 times more effectively than traditional methods at vacuum pressure safe for TMP operation.
Today, ibss Group has expanded its GV10x models and has customers in EM and synchrotron labs around the world successfully using the GV10x and related products. All models have been tested and certified to carry the CE Mark. Further, the GV10x has been approved for use at its full range of power (10 to 99 watts) in Japan, where the Radio Law would normally limit its upper limit to 49 watts.
It is ibss Group’s mission to not only provide the fastest, safest, and most efficient plasma cleaner on the market, but also to develop and maintain long term relationships with customers and operators of the GV10x by providing quick response times and thorough explanations and support that exceed expectations.
We have a long standing commitment to quality and excellence in the high vacuum industry. Started in 1967 the company is a leader in manufacture of high vacuum equipment for thin film coating and etching.
Intlvac Thin Film’s primary goal is to deliver value-added solutions that exceed the expectations of simple PVD and Ion Beam Sputter/Etch machine manufacturing and installation.
We started exporting our systems around the world in 2001, and now have equipment installed across the US, and in Canada, Malaysia, Singapore, Australia, and Israel.
Research and development play a major role in our technology’s edge in the market. Our in-house development lab designs, engineers and manufactures machinery used for Physical Vapor Deposition and ion beam etching. We specialize in engineering solutions for a variety of specific results and outcomes using this process. We provide our customers with machinery needed for creating coatings including ion source and all parts needed to make it function. Additionally, we manufacture high quality PVD coatings using techniques such as Ion Assisted Thermal and Electron Beam Evaporation, Reactive and non-reactive magnetron sputtering. Diamond Like Carbon by Plasma Enhanced Vapor Deposition.
Intlvac Thin Film has become an authority for Ion Beam Etch/Sputter systems and reactive sputter systems for precision optical coatings.
Products & Services:
Thin Film Deposition Systems
Ion Beam Etch & Ion Beam Sputter Systems
Diamond-Like Carbon Systems
Optical Fiber Metalization
Thermal Vacuum & Space Simulation Systems
LK Technologies is a leading supplier of precision equipment for surface science and surface analysis. Our reputation is built on a history of supplying robust, high performance electron and ion-optical equipment to leading academic and industrial laboratories worldwide.
We offer a complete product line of electron energy analyzers and electron & ion sources for surface science, including high resolution (1 meV) analysis. For structural analysis, our LEED and RHEED product line includes a variety of basic systems as well as low current MCP detectors for sensitive samples used in surface science. Finally, we specialize in completely integrated custom vacuum systems which incorporate these techniques and others in high and ultrahigh vacuum studies.
Electron Analyzers and Spectrometers
LEED and RHEED
Thermal Desorption Spectroscopy (TDS, TDP)
UHV Systems for Surface Science
Nanonics Imaging Ltd has developed a unique and highly differentiated product portfolio in the area of Scanning Probe Microscopy (SPM). Over the last two decades its products have stood at the forefront of technology providing answers for a wide range of nanotechnological applications unavailable with other measurement tools.
In this area of SPM, Nanonics Imaging is one of the most innovative companies in the world and this innovation together with unparalleled customer support and collaboration has been the basis of its growth. Today Nanonics has 45 employees in its Jerusalem headquarters and representatives throughout the world.
Nanonics Imaging Ltd. was the first to realize that the integration of scanning probe microscopes with other standard techniques, such as optical microscopy, Raman microprobes, scanning electron microscopes and ion beam microscopes, would introduce critical added value to many of these measurement tools. Thus, its products were developed with such integration in mind and in a variety of these areas it was the first to market such products. It presently has singular and leading offerings in each of these areas.
Furthermore, Nanonics Imaging effectively overcame barriers that had prevented introduction of scanning multi probe microscopes, SPM systems with more than one probe. It was the first company and is still the only company to have a general multiprobe SPM solution including all forms of SPM measurements such as electrical, thermal, optical, mechanical etc.
In addition to the above, a central development of the Company is a novel form of optical microscopy invented by the Founder of Nanonics Imaging, Aaron Lewis. This technique is called Near-Field Scanning Optical Microscopy (NSOM) and Nanonics is a leader in this field worldwide. NSOM is being increasingly recognized as being critical in advancing areas of nano optics and in characterizing plasmonic and photonic devices, optical circuits, advanced opto-electronic components, silicon waveguides and devices and photonic band gap materials and devices.
These nano-optical measurement capabilities even extend to electron and ion beam instrumentation and this has brought super-resolution optical imaging to such areas as cathodoluminescence which have been limited in resolution by far-field optical methods.
In each area of its product offerings Nanonics Imaging has won numerous awards over the years. These awards cover all areas of microscopic innovation including Raman microprobe integration, multiprobe development, unparalleled scanner advances, forefront probe technologies etc. The company has collaborated with numerous companies such as Renishaw Plc, FEI etc providing SPM solutions that transform the offerings of these partners and allow them to reach new nanotechnological horizons.
In parallel Nanonics also has evolved a NanoTool KitTM of probes that are both multiprobe friendly and do not obscure the optical or the electron/ion optical axis of the microscope. This NanoToolKitTM includes optical, electrical, thermal and even probes providing nanovacuum and nanochemical writing capabilities. These latter probes allow for a unique methodology called NanoFountain Pen Nanochemistry which even permits nanochemical lithography on any surface and with any ink including inks that are gaseous reagents.
With its NanoToolKitTM and its highly differentiated offerings of SPM systems, fully protected by a portfolio of patents, Nanonics has shown great potential to provide measurement capabilities that simply have been unachievable in the past. In essence, the Nanonics Imaging combination of products forms the basis of a variety of measurement technologies that are increasingly becoming an integral component in a penetrating nanotechnological revolution that stands at the forefront of present and future technological revolutions.
NSOM & SNOM SPM
Multiprobe AFM, NSOM & Raman
Low Temp AFM, NSOM & Raman
AFM SEM FIB
AFM &SPM Probes
OCI Vacuum Microengineering has been grown out of research being done at a number of universities in Europe, Canada and the United States. The company has a very strong commitment to research and development because of the potential for future commercial opportunities.
Our company manufacturers rear-view LEED-Auger (AES) spectrometers providing nano-scale measurement of the surface periodic structures as well as quantitative elemental analysis using fine electron probe. The spectrometer line is offered in several configurations including mounting flange size (8CF, 6CF and 4.5CF), electron probe current and beam size ranges (from micro-amps to fempto-amps), different detectors (basic hemispherical luminescent, micro-channel plates and pulsed with delay-line), and high energy resolution grids.
In addition, the ion sputtering guns, custom electron guns, ion sources, analyzers and electron gun for inverse-photoemission with energy selector are offered. The units are controlled by dedicated electronics and software featuring simple analog or fully digital convenient control including an on-board microprocessor with USB computer interface.
Electron / Ion Guns
UHV Spectroscopy Systems
Surface Science Fundamentals
Low Energy Electron Diffraction
Auger Electron Spectroscopy