Adhesion analysis for niobium nitride thin films deposited by reactive magnetron sputtering
Florina Maria ȘERDEAN, Violeta Valentina MERIE, Gavril NEGREA, Horea George CRIȘANdownload PDF
Abstract. This paper focuses on determining the adhesion force for four samples of niobium nitride thin films using the atomic force microscope, samples which were deposited by reactive magnetron sputtering on silicon substrates. The main objective is to investigate the influence of the deposition parameters on the adhesion force and other important parameters. Hence, the nitrogen flow rate was varied in order to identify its influence for this type of thin films. Several tests were performed in multiple points of each sample using the spectroscopy in point mode of the atomic force microscope. Using the obtained experimental values and two existing mathematical models for the adhesion force, the surface energy of the niobium nitride thin films was estimated.
Niobium nitride; Thin films; Atomic force microscope; Surface energy; Adhesion
Published online 11/5/2018, 7 pages
Copyright © 2018 by the author(s)
Published under license by Materials Research Forum LLC., Millersville PA, USA
Citation: Florina Maria ȘERDEAN, Violeta Valentina MERIE, Gavril NEGREA, Horea George CRIȘAN, ‘Adhesion analysis for niobium nitride thin films deposited by reactive magnetron sputtering’, Materials Research Proceedings, Vol. 8, pp 212-218, 2018
The article was published as article 24 of the book Powder Metallurgy and Advanced Materials
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