Structural and optical characterization of titanium nitride thin films deposited by magnetron sputtering

Structural and optical characterization of titanium nitride thin films deposited by magnetron sputtering

Violeta Valentina MERIE, Andreia MOLEA, Vlad Nicolae BURNETE, Bogdan Viorel NEAMȚU, Gavril NEGREA

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Abstract. Titanium nitride applicability covers different industries such as microelectronics, biomedicine and so on. This paper presents the analysis of the structural and optical properties of titanium nitride thin films for different deposition conditions. The samples were deposited by direct current magnetron sputtering on silicon substrates. The deposition was done at room temperature, on substrates preheated at 300 °C or on substrates that were polarized at -40 V and -90 V respectively. The results indicate a dependency of the structural orientation with respect to the deposition process when this takes place at room temperature. When the deposition was done on a preheated substrate there was no structural orientation. A negative polarization of the substrate leads to the formation of small sized crystallites. Regarding the optical properties, the films showed good semiconductor properties and a low reflectivity.

Titanium nitride, Thin films, Magnetron sputtering, Reflectivity, Polarized, Semiconductor

Published online 11/5/2018, 9 pages
Copyright © 2018 by the author(s)
Published under license by Materials Research Forum LLC., Millersville PA, USA

Citation: Violeta Valentina MERIE, Andreia MOLEA, Vlad Nicolae BURNETE, Bogdan Viorel NEAMȚU, Gavril NEGREA, ‘Structural and optical characterization of titanium nitride thin films deposited by magnetron sputtering’, Materials Research Proceedings, Vol. 8, pp 134-142, 2018


The article was published as article 15 of the book Powder Metallurgy and Advanced Materials

Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.

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