Preparation of High-Quality Mo-Nb (Ti/Ni-Ti) Sputtering Target by Hot Isostatic Pressing

Preparation of High-Quality Mo-Nb (Ti/Ni-Ti) Sputtering Target by Hot Isostatic Pressing

Zhanfang Wu, Lida Che, Jing He, Haofeng Li, Pengjie Zhang, Xiangyang Li

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Abstract. Mo-Nb, Mo-Ti, Mo-Ni-Ti sputtering target samples were prepared using Mo powder, Nb powder,Ni powder and Ti powder as raw materials by hot isostatic pressing (near net forming). The density, phase composition, microstructure and element distribution of Mo-Nb, Mo-Ti, Mo-Ni-Ti sputtered target samples were measured by optical microscope, scanning electron microscope and energy dispersive spectrometer. The experimental results show that hot isostatic pressing can prepare Mo-Nb target at lower temperature, and the obtained samples have finer grains, higher density and more uniform element distribution than that of non-pressure sintering. High-quality Mo-Nb, Mo-Ti, Mo-Ni-Ti sputtering targets (density>99%, grain size<100 μm) were obtained by hot isostatic pressing. Keywords
Hot Isostatic Pressing, High Quality Sputtering Target, Powder Metallurgy, Density, Grain Size

Published online 12/8/2023, 7 pages
Copyright © 2023 by the author(s)
Published under license by Materials Research Forum LLC., Millersville PA, USA

Citation: Zhanfang Wu, Lida Che, Jing He, Haofeng Li, Pengjie Zhang, Xiangyang Li, Preparation of High-Quality Mo-Nb (Ti/Ni-Ti) Sputtering Target by Hot Isostatic Pressing, Materials Research Proceedings, Vol. 38, pp 113-119, 2023


The article was published as article 17 of the book Hot Isostatic Pressing

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