Adhesion analysis for niobium nitride thin films deposited by reactive magnetron sputtering

Adhesion analysis for niobium nitride thin films deposited by reactive magnetron sputtering

Florina Maria ȘERDEAN, Violeta Valentina MERIE, Gavril NEGREA, Horea George CRIȘAN

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Abstract. This paper focuses on determining the adhesion force for four samples of niobium nitride thin films using the atomic force microscope, samples which were deposited by reactive magnetron sputtering on silicon substrates. The main objective is to investigate the influence of the deposition parameters on the adhesion force and other important parameters. Hence, the nitrogen flow rate was varied in order to identify its influence for this type of thin films. Several tests were performed in multiple points of each sample using the spectroscopy in point mode of the atomic force microscope. Using the obtained experimental values and two existing mathematical models for the adhesion force, the surface energy of the niobium nitride thin films was estimated.

Keywords
Niobium nitride; Thin films; Atomic force microscope; Surface energy; Adhesion

Published online 11/5/2018, 7 pages
Copyright © 2018 by the author(s)
Published under license by Materials Research Forum LLC., Millersville PA, USA

Citation: Florina Maria ȘERDEAN, Violeta Valentina MERIE, Gavril NEGREA, Horea George CRIȘAN, ‘Adhesion analysis for niobium nitride thin films deposited by reactive magnetron sputtering’, Materials Research Proceedings, Vol. 8, pp 212-218, 2018

DOI: http://dx.doi.org/10.21741/9781945291999-24

The article was published as article 24 of the book Powder Metallurgy and Advanced Materials

Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.

References
[1] Z. Stanimirović and I. Stanimirovic , Mechanical properties of MEMS materials, Micro Electronic and Mechanical Systems, book edited by: Kenichi Takahata, p. 572, December 2009, INTECH, Croatia.
[2] A. D. Pogrebnjak, O. V. Bondar, G. Abadias, V. Ivashchenko, O. V. Sobol, S. Jurga and E. Coy, Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations, Ceram. Int., 42 (2016) 11743-11756. https://doi.org/10.1016/j.ceramint.2016.04.095
[3] Y. Lei et al., Fabrication of niobium titanium nitride thin films with high superconducting transition temperatures and short penetration lengths, IEEE Trans. Appl. Supercond., 15 (2005) 44-48. https://doi.org/10.1109/TASC.2005.844126
[4] C.-L. Huang et al., Characteristics of reactively sputtered niobium nitride thin films as diffusion barriers for Cu metallization, Electron. Mater. Lett., 9 (2013) 593-597. https://doi.org/10.1007/s13391-012-2173-0
[5] M. Ziegler et al., Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition, Supercond. Sci. Technol., 26 (2013) 025008-5. https://doi.org/10.1088/0953-2048/26/2/025008
[6] Y. Ufuktepe et al., Superconducting niobium nitride thin films by reactive pulsed laser deposition, Thin Solid Films, 545 (2013) 601-607. https://doi.org/10.1016/j.tsf.2013.08.051
[7] F. Mercier et al., Niobium nitride thin films deposited by high temperature chemical vapor deposition, Surf. Coat. Technol., 260 (2014) 126-132. https://doi.org/10.1016/j.surfcoat.2014.08.084
[8] J.E. Alfonso, J. Buitrago, J. Torres et al., Influence of fabrication parameters on crystallization, microstructure, and surface composition of NbN thin films deposited by rf magnetron sputtering, J. Mater. Sci., 45 (2010) 5528-5533. https://doi.org/10.1007/s10853-010-4612-3
[9] Y. J. Totik, Investigation of the adhesion of NbN coatings deposited by pulsed dc reactive magnetron sputtering using scratch tests, Coat. Technol. Res., 7 (2010) 485-492. https://doi.org/10.1007/s11998-009-9200-6
[10] D.S. Grierson, E.E. Flater, R.W. Carpick, Accounting for the JKR–DMT transition in adhesion and friction measurements with atomic force microscopy, J. Adhes. Sci. Technol., 19 (2005) 291–311. https://doi.org/10.1163/1568561054352685